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Ibrahim D.F.A.; Hasmun N.N.; Liew Y.M.; Venkiteswaran A.
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Ibrahim D.F.A.; Hasmun N.N.; Liew Y.M.; Venkiteswaran A.
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Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration
by
Ibrahim
D.F.A
.;
Hasmun
N.N
.;
Liew
Y.M
.;
Venkiteswaran
A
.
Published in
Photodiagnosis and Photodynamic Therapy
(2024)
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