Structural and optical characterizations of Ge nanostructures fabricated by RF magnetron sputtering and rapid thermal processing
In this work, we use a simple and cost effective technique of sputtering followed by the rapid thermal processing at 900°C for 30 s to form Ge nanostructures on the Si(100) substrate. A layer of Ge (300 nm) and Si cap layer (100 nm) were deposited using RF magnetron sputtering. Two samples were prep...
| Published in: | Acta Physica Polonica A |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
Polish Academy of Sciences
2012
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84856094642&doi=10.12693%2fAPhysPolA.121.16&partnerID=40&md5=d0275b66eb7164f480ec50b907284c2a |