Influence of substrate materials on the structural properties of ZnO thin films prepared by RF magnetron sputtering
ZnO films were deposited on glass and SiO2/Si substrate by RF magnetron sputtering technique using high purity ZnO target at various RF power. The structural properties of ZnO thin film deposited on glass and SiO2/Si substrate were studied. The structural properties of the films were carried out by...
| 出版年: | Jurnal Teknologi |
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| 第一著者: | |
| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
Penerbit UTM Press
2015
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| オンライン･アクセス: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84943227391&doi=10.11113%2fjt.v76.5650&partnerID=40&md5=03c2704b422410f7af3654bda31048ad |
| 要約: | ZnO films were deposited on glass and SiO2/Si substrate by RF magnetron sputtering technique using high purity ZnO target at various RF power. The structural properties of ZnO thin film deposited on glass and SiO2/Si substrate were studied. The structural properties of the films were carried out by the surface profiler and field emission scanning electron microscope (FESEM). It was found that the average grain size of ZnO increases with increasing RF power and ZnO deposited on SiO2/Si substrate with RF power between 50150 Watt gave the lower average grain size which is desired for the gas sensor applications. © 2015 Penerbit UTM Press. All rights reserved. |
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| ISSN: | 1279696 |
| DOI: | 10.11113/jt.v76.5650 |