Radio frequency magnetron sputtering growth of Ni-doped ZnO thin films with nanocolumnar structures
This study describes the RF magnetron sputtering growth of nickel (Ni) doped zinc oxide (ZnO) thin films with nanocolumns (NCs) structures. Using a nickel seed layer, homogeneous and vertically aligned ZnO nanocolumns with a diameter of around 30 nm were successfully grown. The X-ray diffraction (XR...
الحاوية / القاعدة: | Journal of Crystal Growth |
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المؤلف الرئيسي: | |
التنسيق: | مقال |
اللغة: | English |
منشور في: |
Elsevier B.V.
2024
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الوصول للمادة أونلاين: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85199941366&doi=10.1016%2fj.jcrysgro.2024.127835&partnerID=40&md5=b7019d3fa571510075bc2dd4b526b4ab |
الملخص: | This study describes the RF magnetron sputtering growth of nickel (Ni) doped zinc oxide (ZnO) thin films with nanocolumns (NCs) structures. Using a nickel seed layer, homogeneous and vertically aligned ZnO nanocolumns with a diameter of around 30 nm were successfully grown. The X-ray diffraction (XRD) results confirmed the incorporation of Ni atoms into the ZnO lattice, producing single crystalline structures without secondary phases. High-resolution transmission electron microscopy showed clear lattice planes with a d-spacing value of 3.243 Å corresponding to the wurtzite phase of ZnO. Optimal crystalline quality was achieved by growing the films at 300 °C followed by thermal annealing at 300–500 °C in an oxygen ambient. © 2024 Elsevier B.V. |
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تدمد: | 220248 |
DOI: | 10.1016/j.jcrysgro.2024.127835 |