Effect of substrate temperature on structural and morphological properties of indium tin oxide nanocolumns using RF magnetron sputtering

Indium tin oxide (ITO) nanocolumns were successfully deposited on both glass and silicon substrates at different substrate temperature from room temperature to 300°C by radio frequency (RF) magnetron sputtering system using an ITO target. The composition of the ITO target was 90% indium oxide and 10...

詳細記述

書誌詳細
出版年:Advanced Materials Research
第一著者: 2-s2.0-84896888014
フォーマット: Conference paper
言語:English
出版事項: 2014
オンライン・アクセス:https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896888014&doi=10.4028%2fwww.scientific.net%2fAMR.895.12&partnerID=40&md5=706aae0de3e4822d95e837e210f0771f