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Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration
by
Ibrahim
,
Dayang Fadzlina Abang; Hasmun
,
Noren
Nor
;
Liew
,
Yih Miin; Venkiteswaran
,
Annapurny
Published in
PHOTODIAGNOSIS AND PHOTODYNAMIC THERAPY
(2024)
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