Surface morphology study on effect of deposition temperature on nanostructured zinc oxide by chemical vapour deposition method

Nanocrystalline ZnO was grown on Si and porous Si substrates, by chemical vapour deposition without metal catalyst. Increasing deposition temperature from 400 to 450°C at 0.5 L min-1 Ar flow rate, exhibited an improvement in the spread of ZnO, and smaller clusters of ZnO. At the same temperature ran...

詳細記述

書誌詳細
出版年:Materials Research Innovations
第一著者: Khusaimi Z.; Ghani N.A.; Noor F.W.M.; Amizam S.; Rafaie H.A.; Mamat M.H.; Sahdan M.Z.; Abdullah N.; Abdullah S.; Rusop M.
フォーマット: Conference paper
言語:English
出版事項: 2009
オンライン・アクセス:https://www.scopus.com/inward/record.uri?eid=2-s2.0-70149090204&doi=10.1179%2f143307509X437608&partnerID=40&md5=1df3394b71c2016b6c6cae9377e80bea
その他の書誌記述
要約:Nanocrystalline ZnO was grown on Si and porous Si substrates, by chemical vapour deposition without metal catalyst. Increasing deposition temperature from 400 to 450°C at 0.5 L min-1 Ar flow rate, exhibited an improvement in the spread of ZnO, and smaller clusters of ZnO. At the same temperature range in Ar flow rate of 0.4 L min-1, ZnO nanoflower was formed. © W. S. Maney & Son Ltd. 2009.
ISSN:14328917
DOI:10.1179/143307509X437608