Effect of annealing on surface of nickel (Ni) / indium tin oxide (ITO) nanostructures measured by atomic force microscopy (AFM)
Nickel (Ni) / indium tin oxide (ITO) nanostructures were deposited on silicon (111) substrate by RF magnetron sputtering using a nickel target and metallic alloy target (In-Sn, 90%- 10%). The post-deposition annealing has been done for Ni/ITO films in air and the effect of annealing temperature on t...
| Published in: | Advanced Materials Research |
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| Main Author: | |
| Format: | Conference paper |
| Language: | English |
| Published: |
2014
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| Online Access: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84891606062&doi=10.4028%2fwww.scientific.net%2fAMR.832.51&partnerID=40&md5=f81a77ad909b93814f0516e9e7315435 |