| 总结: | This study describes the RF magnetron sputtering growth of nickel (Ni) doped zinc oxide (ZnO) thin films with nanocolumns (NCs) structures. Using a nickel seed layer, homogeneous and vertically aligned ZnO nanocolumns with a diameter of around 30 nm were successfully grown. The X-ray diffraction (XRD) results confirmed the incorporation of Ni atoms into the ZnO lattice, producing single crystalline structures without secondary phases. High-resolution transmission electron microscopy showed clear lattice planes with a d-spacing value of 3.243 Å corresponding to the wurtzite phase of ZnO. Optimal crystalline quality was achieved by growing the films at 300 °C followed by thermal annealing at 300–500 °C in an oxygen ambient. © 2024 Elsevier B.V.
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