A simulation based study on C-V characteristics of oxide thickness for NMOS

A simulation based study on C-V characteristics of oxide thickness for NMOS

This paper report the Capacitance-Voltage (C-V) characterization of gate oxide in the ±10 nm thickness range. The project being done by using SILVACO TCAD software of using ATHENA and ATLAS simulator in order to fabricate the NMOS. To determine the gate oxide thickness, temperature, Asid Hydrocloric...

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Bibliographic Details
Published in:2010 International Conference on Electronic Devices, Systems and Applications, ICEDSA 2010 - Proceedings
Main Author: 2-s2.0-77955286329
Format: Conference paper
Language:English
Published: 2010
Online Access:https://www.scopus.com/inward/record.uri?eid=2-s2.0-77955286329&doi=10.1109%2fICEDSA.2010.5503030&partnerID=40&md5=a00d85f008b0014dc8d2a795210b979e

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https://www.scopus.com/inward/record.uri?eid=2-s2.0-77955286329&doi=10.1109%2fICEDSA.2010.5503030&partnerID=40&md5=a00d85f008b0014dc8d2a795210b979e

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