Structural and optical properties of nickel (Ni)/indium tin oxide (ITO) thin-films deposited by RF magnetron sputtering
Nickel (Ni)/ indium tin oxide (ITO) thin-films have been deposited on silicon (Si) and glass substrates using radio-frequency (RF) magnetron sputtering at 200°C temperature. ITO layer was deposited on top of Ni layer with various deposition parameter. The material and optical properties of the ITO s...
| 出版年: | Advanced Materials Research |
|---|---|
| 第一著者: | |
| フォーマット: | Conference paper |
| 言語: | English |
| 出版事項: |
2014
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| オンライン･アクセス: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896814990&doi=10.4028%2fwww.scientific.net%2fAMR.895.181&partnerID=40&md5=27d08d57ded0f54b3883c756b3bfa436 |