Structural and optical properties of nickel (Ni)/indium tin oxide (ITO) thin-films deposited by RF magnetron sputtering
Nickel (Ni)/ indium tin oxide (ITO) thin-films have been deposited on silicon (Si) and glass substrates using radio-frequency (RF) magnetron sputtering at 200°C temperature. ITO layer was deposited on top of Ni layer with various deposition parameter. The material and optical properties of the ITO s...
الحاوية / القاعدة: | Advanced Materials Research |
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المؤلف الرئيسي: | 2-s2.0-84896814990 |
التنسيق: | Conference paper |
اللغة: | English |
منشور في: |
2014
|
الوصول للمادة أونلاين: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84896814990&doi=10.4028%2fwww.scientific.net%2fAMR.895.181&partnerID=40&md5=27d08d57ded0f54b3883c756b3bfa436 |
مواد مشابهة
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Effect of annealing on structural, optical, and electrical properties of nickel (Ni)/indium tin oxide (ITO) nanostructures prepared by RF magnetron sputtering
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The effect of sputtering pressure on structural, optical and electrical properties of indium tin oxide nanocolumns prepared by radio frequency (RF) magnetron sputtering
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منشور في: (2014) -
Effect of substrate temperature on structural and morphological properties of indium tin oxide nanocolumns using RF magnetron sputtering
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Influence of substrate temperature on morphological and electrical properties of indium tin oxide nanocolumns prepared by RF magnetron sputtering
بواسطة: 2-s2.0-84891594914
منشور في: (2014)