Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration

by Ibrahim, Dayang Fadzlina Abang; Hasmun, Noren Nor; Liew, Yih Miin; Venkiteswaran, Annapurny
Published in PHOTODIAGNOSIS AND PHOTODYNAMIC THERAPY (2024)

Effects of repeated etching cycles using 15% hydrochloric acid on enamel loss and relative attenuation coefficient in resin infiltration

by Ibrahim D.F.A.; Hasmun N.N.; Liew Y.M.; Venkiteswaran A.
Published in Photodiagnosis and Photodynamic Therapy (2024)